The gas-phase reaction thermodynamics in the chemical vapor deposition system of preparing silicon carbide via methyltrichlorosilane
pyrolysis is investigated with a relatively complete set of 226 species, in which the thermodynamic data of 163 species are
evaluated in this work with accurate model chemistry G3(MP2) and G3//B3LYP calculations combined with standard statistical
thermodynamics. The data include heat capacity (
C
p,mθ), entropy (
S
mθ), enthalpy of formation (Δ
f
H
mθ) and Gibbs free energy of formation (Δ
f
G
mθ). All the results are consistent with the available reliable experiments. Based on these thermodynamic data, the equilibrium
concentration distribution of the 226 possible species in 300–2,000 K is evaluated with the chemical equilibrium principle
under a typical experimental condition. It is shown that the theoretical results are in very good agreement with the experiments.
We conclude that the present work is instructive for experiments with different conditions.
Keywords Chemical vapor deposition - Equilibrium concentration distribution - Methyltrichlorosilane pyrolysis - Silicon carbide - Thermodynamics