Chronic exposure of the skin to sunlight causes damage to the underlying connective tissue with a loss of elasticity and firmness.
Silicon (Si) was suggested to have an important function in the formation and maintenance of connective tissue. Choline-stabilized
orthosilicic acid (“ch-OSA”) is a bioavailable form of silicon which was found to increase the hydroxyproline concentration
in the dermis of animals. The effect of ch-OSA on skin, nails and hair was investigated in a randomized, double blind, placebo-controlled
study. Fifty women with photodamaged facial skin were administered orally during 20 weeks, 10 mg Si/day in the form of ch-OSA
pellets (
n=25) or a placebo (
n=25). Noninvasive methods were used to evaluate skin microrelief (forearm), hydration (forearm) and mechanical anisotropy
(forehead). Volunteers evaluated on a virtual analog scale (VAS, “none=0, severe=3”) brittleness of hair and nails. The serum
Si concentration was significantly higher after a 20-week supplementation in subjects with ch-OSA compared to the placebo
group. Skin roughness parameters increased in the placebo group (Rt:+8%; Rm: +11%; Rz: +6%) but decreased in the ch-OSA group
(Rt: −16%; Rm: −19%; Rz: −8%). The change in roughness from baseline was significantly different between ch-OSA and placebo
groups for Rt and Rm. The difference in longitudinal and lateral shear propagation time increased after 20 weeks in the placebo
group but decreased in the ch-OSA group suggesting improvement in isotropy of the skin. VAS scores for nail and hair brittleness
were significantly lower after 20 weeks in the ch-OSA group compared to baseline scores. Oral intake of ch-OSA during the
20 weeks results in a significant positive effect on skin surface and skin mechanical properties, and on brittleness of hair
and nails.
Keywords Photodamaged skin - Silicon - Orthosilicic acid - Nails - Hair
An erratum to this article can be found at
http://dx.doi.org/10.1007/s00403-006-0650-8