The interaction of a surface with the two-phase flow of a multicomponent vacuum-arc plasma containing droplets of an evaporated material along with multicharged ions and neutral atoms is studied. For the two-phase flow of a multicomponent plasma, the dependences of the ion-current density, the deposition rate, and the heat flow to a substrate on the bias voltage are obtained, and the conditions at which the coating deposition rate is inverted are determined. A unique probe technique for the plasma flow generated by an end-face Hall plasma accelerator with a “cold” eroded cathode is used to determine the volt-equivalent energy U** of the interaction of the two-phase plasma flows of Ti, Al, Cr, and an Ni-Cr-Al-Y alloy with a surface and the self-sputtering coefficient of the Ni-Cr-Al-Y alloy and its elements (Ni, Cr, Al) as a function of the bias voltage. Metallographic analysis is used to study the structure of thick (∼100-μm) coatings deposited from the two-phase flow of a metallic multicomponent vacuum-arc plasma.