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Understanding the Effect of Intradie Random Process Variations in Nanometer Domino Logic
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Understanding the Effect of Intradie Random Process Variations in Nanometer Domino Logic
Massimo Alioto18 , Gaetano Palumbo19 and Melita Pennisi19 
| (18) |
DII – Deparment of Information Engineering, University of Siena, via Roma 56, 53100 Siena, Italy |
| (19) |
University of Catania, DIEES, viale A. Doria 6, 95125 Catania, Italy |
Abstract
In this paper, the impact of intradie process variations on the delay of nanometer Domino logic is investigated. Analysis
shows that Domino logic circuits suffer from a 2X higher variability compared to static CMOS logic, which translates into
a greater speed penalty. The main variability sources of Domino gates at the circuit level are identified and analyzed by
means of simple circuit models and Monte Carlo simulations on a 90 nm CMOS technology. The role positive feedback in Domino
gates is also discussed in depth as a very important source of delay variations in nanometer technologies.
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