Since the 1950s, Scanning Electron Microscopy (SEM) has been commercially available and used to measure feature sizes below1 micron. Modified SEMs have been employed since the 1960s to perform sub-micron lithography, which then made rapid advances in the 1990s to a process, known as electron beam lithography (EBL). Since the 1980s, Surface Tunneling Microscopy (STM) and Atomic Force Microscopy (AFM) have ushered the era of nanotechnology where it is possible to measure and control the manipulation of matter on the 100nm scale and below. These techniques are broadly classified as “Scanning Probe Microscopy (SPM)”. The earliest forms of nanofabrication using STM based approaches were used to pattern “hard” materials (such as silicon-dioxide; as opposed to “soft” materials such as polymers or biological materials) and restricted to single layer processing. These methods were initially motivated by applications in the semi-conductor industry.