Carrier lifetime analysis in thin gate oxide FD-SOI n-MOSFETs by gate-induced drain current transients

K. Hayama, K. Takakura, H. Ohyama, J. M. Rafí, A. Mercha, E. Simoen and C. Claeys

From the issue entitled "Special Issue: Papers from the 6th International Conference on Materials for Microelectronics and Nanoengineering (MFMN2006) Guest Editor: Patrick McNally"

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Abstract

The drain current (ID) transients by switching the biasing condition are examined in FD-SOI MOSFETs with negative biased back gate voltage (VBG). Special attention is paid to the influence of the gate-induced charge/discharge of the floating body on the ID transient. The ID transient appears not only by switching the front gate voltage (VFG) but also by switching VBG. It is also shown that the analysis of a small VFG step transient is useful to examine the lifetime under different bias conditions. All the results can be explained by the transitional change of ID − VFG characteristics at different body-charge conditions.

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